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Intel · Ireland, Leixlip

# Senior Lithography and Photomask Process Engineer

Ireland, Leixlip Senior individual contributor €103,000.00 - €161,000.00 Manufacturing & Production 

Listed on Intel’s official careers site. Posted September 30, 2026. Check that it is still open and apply there.
[Apply on Intel’s careers site →](https://intel.wd1.myworkdayjobs.com/External/job/Ireland-Leixlip/Senior-Lithography-and-Photomask-Process-Engineer_JR0287375)

[OpenNash Jobs](https://jobs.opennash.com/) / [Intel](https://jobs.opennash.com/companies/intel/) / Senior Lithography and Photomask Process Engineer

## Job description

### Job Details

Job Description: Key Responsibilities:

### Photomask and Reticle Operations
- Oversee photomask incoming quality control, pellicle integrity, reticle qualification protocols, and reticle lifecycle management across advanced EUV and DUV toolsets.

### Advanced Pellicle Development
- Drive next gen EUV pellicle development, material optimization for enhanced transmission, stability, defect mitigation and overall yield improvement. Optimize reticle usage, inspection and disposition strategies over life cycle.

### Cross-Functional Process Integration
- Partner closely with Scanner/Litho teams, Reticle Design, Thin Films, Etch, and Yield Enhancement engineering teams to diagnose patterning excursions and accelerate technology transitions.

### Yield Ramp and Excursion Containment
- Lead root cause failure analysis (RCFA) for yield-limiting lithography and reticle-related defects during new process node development and high-volume manufacturing (HVM).

### Technical Mentorship and Industry Engagement
- Provide technical leadership to junior and mid-level process engineers, establish standard operating procedures (SOPs), and collaborate directly with leading lithography and mask equipment suppliers.

### Qualifications

Education: M.S. with 8+ years of foundry experience or Ph.D. of Foundry experience in Electrical Engineering, Chemical Engineering, Materials Science, Physics, Optics, Microelectronics, or a related semiconductor engineering discipline.

### Experience
- 8+ years of hands-on process engineering experience in advanced semiconductor lithography and photomask/reticle technologies within high-volume manufacturing (HVM) or advanced technology development fabs.

### Photomask and Reticle Expertise
- In-depth knowledge of mask fabrication, mask metrology, aerial image modeling, pellicle technology, reticle degradation mechanisms, and mask defect inspection platforms.

### Lithography Toolset and Process Knowledge
- Proven proficiency across DUV (ArFi / 193nm immersion) and EUV exposure systems (ASML Twinscan / NXE platforms), track integration, and advanced CD metrology.

### Analytical and Statistical Mastery
- Advanced proficiency with Statistical Process Control (SPC), Design of Experiments (DOE), yield analytics platforms, JMP, Python, or MATLAB for complex data modeling and multivariate analysis.

### Leadership and Communication
- Track record of driving cross-functional taskforces, writing comprehensive technical documentation, and delivering executive briefings on process yield, tool performance, and quality enhancements.

We invite you to bring your technical expertise and innovative vision to Intel Foundry, where your work will drive the next generation of semiconductor technology. Join us to make an impact and advance your career in a dynamic, collaborative environment.

### Job Type

Experienced Hire Shift: Shift 1 (Ireland)

### Primary Location

Ireland, Leixlip Additional Locations: Posting Statement: All qualified applicants will receive consideration for employment without regard to race, color, religion, religious creed, sex, national origin, ancestry, age, physical or mental disability, medical condition, genetic information, military and veteran status, marital status, pregnancy, gender, gender expression, gender identity, sexual orientation, or any other characteristic protected by local law, regulation, or ordinance.

Position of Trust N/A EU Salary We offer a total compensation package that ranks among the best in the industry. Annual Salary Range for this job which could be performed in Ireland is: €103,000.00 - €161,000.00 The compensation range displayed in this posting reflects the minimum and maximum target compensation for this position. Within this range, individual pay is determined by job related skills, experience, and relevant education, training.

As part of our total compensation approach, the final offer may include additional pay components and benefits. Your recruiting team will share the confirmed base salary along with any applicable total compensation elements upon employment offer delivery. Work Model for this Role This role will be eligible for our hybrid work model which allows employees to split their time between working on-site at their assigned Intel site and off-site. * Job posting details (such as work model, location or time type) are subject to change. *

## At a glance
- Posted by the employer: Sep 30, 2026
- First seen by OpenNash: Oct 11, 2026
- Last checked: Oct 18, 2026
- Listed for: 18 days
- Location: Ireland, Leixlip
- Pay: €103,000.00 - €161,000.00[Apply on Intel’s careers site →](https://intel.wd1.myworkdayjobs.com/External/job/Ireland-Leixlip/Senior-Lithography-and-Photomask-Process-Engineer_JR0287375)

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